Vacuum Coating

Thin-film process stability comes from the coordination of gas input, chamber state and the vacuum system; the nominal parameters of a single component cannot replace judgment of the whole process window.

The product portfolio covers process gas delivery, flow and pressure actuation, chamber composition monitoring and modular gas-line connection.

Photovoltaic cell manufacturing resembles semiconductor fabs but runs at GW-scale lines with higher gas volumes and faster cadence. From BSF and PERC to TOPCon and HJT, technology evolution keeps raising the variety and volume of process gases. MFCs are essential in diffusion furnaces, PECVD, and LPCVD tools; their accuracy directly drives cell yield and line stability.

PECVD is the core deposition step. PERC lines use TMA/N₂O for the rear Al₂O₃ passivation and SiH₄ (200–1000 sccm) with NH₃ (2–10 slm) for the front SiNₓ anti-reflection layer — silane demands metal-sealed MFCs with VCR fittings and normally-closed valves. TOPCon adds LPCVD/PECVD-Poly with phosphine or diborane doping (toxic, requiring double-concentric tubing and helium leak checking). HJT is extremely sensitive to O₂/H₂O and needs electropolished flow paths, with 2–3× the silane usage of PERC.

In diffusion furnaces, dopant flow (PH₃, B₂H₆) determines doping uniformity and thus cell efficiency; pressure controllers stabilize the liquid source against the chamber. For high-temperature processes, MFCs need composite heat-sink structures to hold within ±0.5% at 200–300°C+ gas inlet temperatures.

Safety and cleanliness are the baseline: silane is pyrophoric, toxic-gas wetted parts need corrosion-resistant alloys, and MFCs should be metal-sealed and helium-checked. Digital MFCs deliver sub-second response for fast pump/vent cycles.

HNR supplies flow and pressure control components matched to PERC/TOPCon/HJT lines, covering high-purity delivery and precise proportioning of silane, ammonia, and phosphine.