PS300 Differential-Pressure Mass Flow Controller
Differential-pressure mass flow controller for precision fluid control and ultra-high-purity gas systems. High-speed pressure sensors and fast, stable piezoelectric actuators combined with a 32-bit CPU deliver response below 0.8 s across the full flow range. Calibrated against real process gases with a built-in gas property database.
Key capabilities
- Flow Range
- ≤ 0.8 秒
- Accuracy
- ±1.0% S.P. (20-100% F.S.), ±0.2 F.S. (1-20% F.S.)
- Response Time
- 10SCCM - 20SLM
- Communications
- ≤ 5×10⁻¹¹ Pa·m³/s (He)
- Fast Response
- High-speed sensors, stable piezoelectric actuators and optimized algorithms: full-range response ≤ 0.8 s
- High Accuracy
- Real process gas calibration with built-in gas property database: ±1% S.P. (20-100% F.S.)
- Wide Dynamic Range
- 1-100% F.S. control range, optional 0.5-100% F.S.
- Pressure Insensitivity
- Integrated control algorithm minimizes the effect of supply pressure fluctuations
- Multi-Gas / Multi-Range
- Change gas type and full-scale flow locally via dedicated software
The PS300 differential-pressure mass flow controller is designed for precision fluid control and ultra-high-purity gas systems. High-speed pressure sensors and fast, stable piezoelectric actuators, combined with a 32-bit CPU and optimized algorithms, deliver fast response below 0.8 s across the entire flow range.
Real process gas calibration and a built-in gas property database improve actual flow accuracy. The 1-100% F.S. wide dynamic control range (0.5-100% F.S. optional) and integrated pressure-insensitivity algorithm maintain stable control despite supply pressure fluctuations. Gas type and full-scale range can be changed locally via dedicated software.
Widely used in gas component manufacturing, PVD and CVD, optical glass coating, LED production, vacuum technology, photovoltaic manufacturing, and semiconductor processes including ion implantation, etching, and atomic layer deposition.
Detailed specifications
General Specifications
| Series | 气体可配置可选多气体多量程功能 |
|---|---|
| Gas | 10SCCM - 20SLM |
| Flow Control Range | 1-100% F.S. (0.5-100% F.S. 可选) |
| 响应时间 | < 0.8 秒 |
| Full Scale | ±1.0% S.P. (20-100% F.S.), ±0.2% F.S. (1-20% F.S.) |
| 重复性 | ±0.3% S.P. (20-100% F.S.), ±0.06% F.S. (1-20% F.S.) |
| 温度敏感度（自 25℃） | ±0.05% S.P./℃ (20-100% F.S.), ±0.01% F.S./℃ (1-20% F.S.) |
| 零点/量程稳定性 | ±1.0% F.S. / 年 |
| 安装方向 | 任意 |
Pressure & Temperature
| Proof Pressure | 1000 kPa(A) |
|---|---|
| Inlet Working Pressure | 240-450 kPa(A) |
| Inlet Pressure Accuracy | ±10 kPa (0-1000 kPa(A)) |
| Working Differential Pressure | ≥ 240 kPa(D) |
| Working Temperature | 15-45 ℃ |
| Storage Temperature | 0-80 ℃ |
Accuracy & Performance
| Flow Accuracy (25℃) | SUS 316L |
|---|---|
| 密封材质 | 全金属密封 |
| 阀门类型 | 压电陶瓷阀，常闭 |
| 阀片泄露 | < 1.0% F.S. |
| 泄漏率 | ≤ 5×10⁻¹¹ Pa·m³/s (He) |
| Stability | 1/4 英寸 VCR 公头 |
| 防护等级 | IP40 |
Interface & Electrical
| Power Supply | +9~36 VDC, 最大 1A |
|---|---|
| Communication Protocol | 模拟信号, Modbus/RS-485, DeviceNet, EtherCAT |
| 电气接口 | 9-pin D-Sub (模拟和供电), RJ-45 (RS-485), 5-pin M12 (DeviceNet), 5-pin M8 和 RJ-45 (EtherCAT) |
Selection Support
Share your application scenario, media or sample, interface and control requirements; we will help verify viable configurations against published documentation.
可核对的已发布信息：Fast Response、High Accuracy、Wide Dynamic Range、Pressure Insensitivity
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